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About:
clgr:
Extreme_ultraviolet_lithography
Property
Value
rdf:
type
owl:
NamedIndividual
Laser article
Plasma physics article
rdfs:
label
Extreme ultraviolet lithography
owl:
sameAs
dbr:
Extreme_ultraviolet_lithography
prov:
wasDerivedFrom
http://en.wikipedia.org/wiki/Category:Main_topic_classifications
http://en.wikipedia.org/wiki/Index_of_physics_articles_(D)
http://en.wikipedia.org/wiki/List_of_laser_articles
http://en.wikipedia.org/wiki/List_of_plasma_physics_articles
http://en.wikipedia.org/wiki/Advanced_Light_Source
http://en.wikipedia.org/wiki/Lawrence_Livermore_National_Laboratory
http://en.wikipedia.org/wiki/Moore's_law
http://en.wikipedia.org/wiki/Nanochemistry
http://en.wikipedia.org/wiki/Microsystems_Technology_Office
skos:
prefLabel
Extreme ultraviolet lithography
skos:
altLabel
13.5 nm extreme ultraviolet (EUV) lithography
30 nm
EUV
EUV lithography
EUV-Lithographie
EUVL
deep ultraviolet lithography
extreme ultraviolet
extreme ultraviolet (EUV) lithography
extreme ultraviolet lithography
lithography
much shorter than visible light
is
clgo:
knownFor
of
David Attwood (physicist)